High-temperature behavior of amorphous alumina coatings: Insights from in-situ nanoindentation and X-ray diffraction studies

A Zaborowska and L Kurpaska and M Zielinsk and Q Xu and E Wyszkowska and J O'Connell and JH Neethling and F Di Fonzo and M Frelek-Kozak and S Papanikolaou and R Diduszko and J Jagielski, CERAMICS INTERNATIONAL, 51, 12918-12931 (2025).

DOI: 10.1016/j.ceramint.2025.01.134

Further development of nuclear power plant technology relies heavily on materials' durability under operating conditions. Estimating the materials' performance in the operando tests is crucial. In this paper, the mechanical behavior of thin amorphous nuclear-dedicated Al2O3 coatings deposited by pulsed laser deposition was investigated by nanoindentation over the temperature range of 25-650 degrees C. Experimental nanomechanical analysis was supported by MD simulations. The results indicate that the hardness of the amorphous coating experiences a gradual, constant decrease with temperature, while the Young modulus value remains constant in the whole temperature range. Observed phenomena confirm the increasing plasticity of the material and it is postulated to be related to the bond-switching mechanism that accelerates at high temperatures. The post-mortem transmission electron microscopy characterization confirmed that the loaded material was non- crystalline over the entire range of the indentation temperatures. The thermal stability of the structure was further studied in-situ up to 1050 degrees C by X-ray diffraction. The implemented methodology allowed us to follow the dynamic process of phase transitions occurring in the material above 650 degrees C. First, thermally activated crystallization was observed at 700 degrees C. Intermediate alumina phases were present up to 950 degrees C, while above this temperature, exclusively the thermodynamically stable alpha-Al2O3 was observed. The in-situ high- temperature characterization of the evolution of thin films boosts the understanding of the application limits of the coating systems at elevated temperatures. The added value is that the paper demonstrates the potential usefulness of combining high-temperature techniques to characterize the complete behavior of thin films at elevated temperatures.

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