A new method for characterizing the atomic composition distribution and interface structure of ultrathin multilayer films using molecular dynamics simulation assisted ARXPS

JJ Du and HX Yuan and HJ Kou and ZC Yao and PF Gao and PF Wu and C Zhang, APPLIED SURFACE SCIENCE, 663, 160194 (2024).

DOI: 10.1016/j.apsusc.2024.160194

Characterizing ultrathin multilayer films' atom distribution and interface structure remains challenging. This paper innovatively characterized the chemical composition and distribution of Pt/Co/W ultrathin multilayer films by ARXPS. Molecular dynamics simulated the growth process of films to correspond to that in experiment. The results show that through ARXPS, the actual structure of Pt (2 nm)/Co (t = 0.5-3 nm)/W (2 nm) film could be obtained. For Pt (2 nm)/Co (2 nm)/W (2 nm) film, the actual structure was Pt/Co (1.73 nm)/W (0.78 nm)/ WO3 + WO2 (1.48 nm). W at the top layer significantly diffused to the bottom layers, and oxidized W reduced from the surface to the interior of multilayer films. Molecular dynamics simulation confirmed that the interdiffusion degree of Co and W atoms was improved with the increase of Co atoms. The growth modes of Co and W layers were respectively layer-by-layer and island. As the number of Co atoms increased, the relative surface roughness of Co and W layers and the relative interface roughness of Co/W were increased. The in-plane magnetic anisotropy and coercivity were respectively enhanced and decreased due to the change in the surface/interface structure. This paper provides a new idea for analyzing ultrathin multilayer films' atom distribution and interface structure.

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