Molecular dynamics simulation of the formation of carbon structures during carbon vapor deposition on Ni substrate

VO Ryabov and VA Andryushchenko and DS Gluzdov, MENDELEEV COMMUNICATIONS, 34, 795-797 (2024).

DOI: 10.1016/j.mencom.2024.10.009

Molecular dynamics simulation of carbon vapor deposition on Ni substrate in the temperature range from 300 to 1750 K was performed. It was found that at temperatures below 1000 K, ordered carbon structures are most actively formed in the gas phase. At temperatures of 1000-1500 K, carbon rings are formed near the surface of the Ni substrate, and close to the melting temperature, no structures are observed.

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